Electron-beam lithography of optical elements for x-ray range (Poster Paper)

Sergey V. Babin; Alexei I. Erko

doi:10.1117/12.136025

9 July 1992 Electron-beam lithography of optical elements for x-ray range (Poster Paper)

Sergey V. Babin, Alexei I. Erko

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136025
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

Experimental investigations and special software for the e-beam exposure system gives the possibility of decreasing the influence of proximity effects and field distortion. The results of creating a focusing element for the soft x-ray range are described: amplitude and phase- contrast Fresnel zone plates as well as reflected Bragg-Fresnel lenses on the base of multilayer x-ray mirrors.

Citation Download Citation

Sergey V. Babin and Alexei I. Erko "Electron-beam lithography of optical elements for x-ray range (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136025

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