keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper)

Robert Fedosejevs; Romuald Bobkowski; James N. Broughton; B. Harwood

doi:10.1117/12.136027

9 July 1992 keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper)

Robert Fedosejevs, Romuald Bobkowski, James N. Broughton, B. Harwood

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136027
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

A keV x-ray source based on plasma production using a high repetition rate picosecond KrF laser has been developed. By using a train of 50 ps input pulses to extract a KrF amplifier module an output train of pulses of energy up to 200 mJ has been obtained leading to generation of 1.15 keV x-rays from solid copper targets with a conversion efficiency from laser light to x-rays of over 1.5%. Iron and nickel targets yield softer x-ray spectra with higher conversion efficiencies of 2.3% and 1.8% respectively. When operated at 20 Hz in one atmosphere of background helium gas a point source of 1.15 keV x-rays with an average power of 45 mW is obtained. Initial characterization of the sensitivities of a positive resist, PBS, and a negative resist, Shipley XP90104C, have been carried out to demonstrate the effectiveness of the source.

Citation Download Citation

Robert Fedosejevs, Romuald Bobkowski, James N. Broughton, and B. Harwood "keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136027

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