Analysis of photosensitive salt distribution in polymer films by 19F multiple-quantum NMR

Bruce E. Scruggs; Karen K. Gleason

doi:10.1117/12.59752

1 June 1992 Analysis of photosensitive salt distribution in polymer films by ¹⁹F multiple-quantum NMR

Bruce E. Scruggs, Karen K. Gleason

Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992) https://doi.org/10.1117/12.59752
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

In this work, the dispersion of triphenylsulfonium metal-fluoride salts in polymer films modeling chemically amplified resist systems has been characterized by solid-state 19F multiple-quantum nuclear magnetic resonance (MQ-NMR). Previously, this technique has been used to characterize 1H distributions on a length scale of approximately 20 angstroms in various materials. In agreement with differential scanning calorimetry, metal- fluoride salts were shown to be immiscible with the nonpolar polymers, poly-n- butylmethacrylate (PnBMA) and poly-isobutylmethacrylate (PiBMA), with no indication of individual salt molecules solubilized within the polymer matrix. Metal-fluoride salts in poly- methylmethacrylate (PMMA) were observed to be dispersed on a molecular scale even at a salt loading of 20% wt/wt. Although observed by electron microscopy, evidence of larger aggregates is absent in the MQ-NMR data of the salt/PMMA films, indicating that these aggregates represent a small fraction of the total salt in these films. In addition, unlike electron microscopy, MQ-NMR is nondestructive with respect to the photosensitive salt and polymers comprising resist systems.

Citation Download Citation

Bruce E. Scruggs and Karen K. Gleason "Analysis of photosensitive salt distribution in polymer films by ¹⁹F multiple-quantum NMR", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59752

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