Paper
1 June 1992 Design of PACs for high-performance photoresists (I): role of di-esterified PACs having hindered -OH groups
Ryotaro Hanawa, Yasunori Uetani, Makoto Hanabata
Author Affiliations +
Abstract
Steric hindrance on a ballast molecule causes selective esterification of -OH groups and provides novel di-esterified PACs having -OH group(s) with high selectivity. These novel PACs give photoresists higher sensitivities, (gamma) -values and resolutions, than those of fully esterified PACs. Also, these novel PACs provide scum-free patterns. Comparison of dissolution properties of a novel di-esterified PAC having a sterically hindered -OH with those of a di-esterified PAC suggests that the presence of -OH enhances dissolution rates, but it does not change the slope of logR-logE plots. DRM's agitated development reduces a large (gamma) -value of a novel PAC observed in puddle development. On the other hand, (gamma) -values of fully esterified PACs were not affected by the change of development methods. This observation suggests significance of (gamma) - value evaluation by puddle development for the investigation of high performance PACs.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryotaro Hanawa, Yasunori Uetani, and Makoto Hanabata "Design of PACs for high-performance photoresists (I): role of di-esterified PACs having hindered -OH groups", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59733
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Cited by 1 scholarly publication.
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KEYWORDS
Molecules

Picture Archiving and Communication System

Photoresist materials

Photoresist developing

Lithography

Absorption

Analytical research

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