Influence of sensitizer spatial distribution on the dissolution mechanism in diazonaphthoquinone resists

Veena Rao; William D. Hinsberg; Curtis W. Frank; Roger Fabian W. Pease

doi:10.1117/12.59732

1 June 1992 Influence of sensitizer spatial distribution on the dissolution mechanism in diazonaphthoquinone resists

Veena Rao, William D. Hinsberg, Curtis W. Frank, Roger Fabian W. Pease

Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992) https://doi.org/10.1117/12.59732
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

The inhibition mechanism in diazonaphthoquinone positive resists has been widely studied. The ability of the photoactive compound to retard the dissolution of the matrix resin has been attributed to both chemical interactions between resist components as well as spatial distribution of sensitizer in a resist film. Our work has focused on understanding the physical distribution of the photoactive compound on the development behavior of this class of positive resists. We have used Langmuir-Blodgett deposition to fabricate resist structures with highly stratified sensitizer distributions. Dissolution measurements using a quartz crystal microbalance have demonstrated that preferential placement of very thin layers of sensitizer both at the surface of a resist film and embedded between two layers of polymeric resin can significantly affect development.

Citation Download Citation

Veena Rao, William D. Hinsberg, Curtis W. Frank, and Roger Fabian W. Pease "Influence of sensitizer spatial distribution on the dissolution mechanism in diazonaphthoquinone resists", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59732

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