Selectively DNQ-esterified PAC for high-performance positive photoresists

Kazuya Uenishi; Shinji Sakaguchi; Yasumasa Kawabe; Tadayoshi Kokubo; Medhat A. Toukhy; Alfred T. Jeffries III; Sydney G. Slater; Rodney J. Hurditch

doi:10.1117/12.59735

1 June 1992 Selectively DNQ-esterified PAC for high-performance positive photoresists

Kazuya Uenishi, Shinji Sakaguchi, Yasumasa Kawabe, Tadayoshi Kokubo, Medhat A. Toukhy, Alfred T. Jeffries III, Sydney G. Slater, Rodney J. Hurditch

Author Affiliations +

Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992) https://doi.org/10.1117/12.59735
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

DNQ-PACs with varying number of OH groups unesterified were examined for their imaging performance in novolac-based positive resists by means of a dissolution rate study. PACs generally lost dissolution inhibition with increasing numbers of the unesterified OH groups when compared to fully esterified PACs, whereas certain particular PACs still retained strong inhibition even when an OH was left unesterified. Such PACs lost inhibition quickly when one or more OH was left unesterified and gave a large dissolution discrimination upon exposure that resulted in high resolution of the resist. High hydrophobicity and remote DNQ configuration of the PAC molecule, and probably the steric crowding around the OH group appear to be structural requirements for obtaining such a high performance PAC. The PACs also provided an advantage in good solubility to resist solvent, and can be practically made by a proposed selective DNQ esterification.

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Kazuya Uenishi, Shinji Sakaguchi, Yasumasa Kawabe, Tadayoshi Kokubo, Medhat A. Toukhy, Alfred T. Jeffries III, Sydney G. Slater, and Rodney J. Hurditch "Selectively DNQ-esterified PAC for high-performance positive photoresists", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59735

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