Studies of dissolution inhibition mechanism of DNQ novolak resists: part III--secondary inhibition with quaternary ammonium salts in development process

Kenji Honda; Bernard T. Beauchemin Jr.; Rodney J. Hurditch; Andrew J. Blakeney; Tadayoshi Kokubo

doi:10.1117/12.59760

1 June 1992 Studies of dissolution inhibition mechanism of DNQ novolak resists: part III--secondary inhibition with quaternary ammonium salts in development process

Kenji Honda, Bernard T. Beauchemin Jr., Rodney J. Hurditch, Andrew J. Blakeney, Tadayoshi Kokubo

Author Affiliations +

Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992) https://doi.org/10.1117/12.59760
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

The dissolution behavior of films comprising novolak polymers and oligomers having defined structural characteristics has been investigated by means of near-real-time UV and FT-IR spectroscopic measurements. The observed results are correlated with the behavior of practical resists and the solution chemistry of related model compounds in order to provide a better understanding of the mechanism of dissolution inhibition with emphasis on `secondary' reactions occurring during the development process. In particular, evidence is presented for the formation of a stable TMA+/novolate- complex which may influence the dissolution inhibition dependency of the novolak microstructure.

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Kenji Honda, Bernard T. Beauchemin Jr., Rodney J. Hurditch, Andrew J. Blakeney, and Tadayoshi Kokubo "Studies of dissolution inhibition mechanism of DNQ novolak resists: part III--secondary inhibition with quaternary ammonium salts in development process", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59760

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