Study of photosensitizer for i-line lithography

Tomoyuki Kitaori; Seiki Fukunaga; Hiroo Koyanagi; Shin'ichi Umeda; Kohtaro Nagasawa

doi:10.1117/12.59734

1 June 1992 Study of photosensitizer for i-line lithography

Tomoyuki Kitaori, Seiki Fukunaga, Hiroo Koyanagi, Shin'ichi Umeda, Kohtaro Nagasawa

Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992) https://doi.org/10.1117/12.59734
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

In this paper, diazo derivatives having various ballasts are newly evaluated as the sensitizers for i-line resist system. The selection of the ballast of the sensitizer can be executed on the basis of Dill's A parameter. The derivation of a mathematical expression, which is usable for the optimization of the quantity of a sensitizer in resist system, is also described. The experimentally obtained optimal value is confirmed to show a good fit with the value given by the expression.

Citation Download Citation

Tomoyuki Kitaori, Seiki Fukunaga, Hiroo Koyanagi, Shin'ichi Umeda, and Kohtaro Nagasawa "Study of photosensitizer for i-line lithography", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59734

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