Paper
1 July 1992 Application of differential photoreflectance spectroscopy in selective modulation of a layer within multilayer device structures
Alireza Badakhshan, Michael Sydor, Kambiz Alavi, N. Teraguchi, Hadis Morkoc
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Abstract
This paper describes the application of a novel approach in electric field modulation spectroscopy, the differential photoreflectance (DPR), to study buried GaAs/AlGaAs heterostructures. We show that in most complicated device structures. DPR can provide selective photoreflectance (PR) response from layers buried within thin multilayer structures. Such responses are often superimposed on one another in conventional PR measurements. DPR measurement is achieved through alternative modulations from two laser pumps with different penetration depths, so that the modulation has a gradient with respect to the depth within the sample. The application of this technique is demonstrated for a two-dimensional electron gas (2DEG) of a modulation doped heterojunction in comparison with conventional PR. In one case the heterojunction of interest was buried under two highly doped GaAs and AlGaAs layers 40 nm thick. We show that this heterojunction is barely distinguishable in a PR measurement. Nevertheless, at room temperature DPR shows distinct peaked signals that correspond to the previously reported PR from a two-dimensional electron gas.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alireza Badakhshan, Michael Sydor, Kambiz Alavi, N. Teraguchi, and Hadis Morkoc "Application of differential photoreflectance spectroscopy in selective modulation of a layer within multilayer device structures", Proc. SPIE 1678, Spectroscopic Characterization Techniques for Semiconductor Technology IV, (1 July 1992); https://doi.org/10.1117/12.60455
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Cited by 1 scholarly publication.
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KEYWORDS
Modulation

Gallium arsenide

Heterojunctions

Field effect transistors

Interfaces

Spectroscopes

Phase shift keying

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