Paper
13 January 1993 Fabricating binary optics in infrared and visible materials
Margaret B. Stern, Michael Holz, Theresa Rubico Jay
Author Affiliations +
Abstract
An overview of binary optics fabrication techniques, optimized to obtain high-quality micro- optics in visible and infrared materials, is presented. Maximum optical efficiency has been achieved for diffractive quartz microlenses at (lambda) equals 633 nm by controlling the critical fabrication parameters of alignment and etch depth. The degradation in optical efficiency of four-phase-level fused silica microlenses, resulting from an intentional 0.35 micrometers translational error, has been systematically measured as a function of lens speed (F/3 - F/65). Novel processing techniques that enable the fabrication of IR and visible refractive micro-optic arrays such as multilayer resist techniques, deep anisotropic Si-etching, and the formation of analog polymer lenslet arrays are described. Initial results are presented for both monolithic and hybrid integration of layered refractive micro-optic systems.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Margaret B. Stern, Michael Holz, and Theresa Rubico Jay "Fabricating binary optics in infrared and visible materials", Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); https://doi.org/10.1117/12.138908
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Cited by 9 scholarly publications.
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KEYWORDS
Microlens

Micro optics

Diffraction

Reactive ion etching

Etching

Microlens array

Fabrication

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