Excimer laser ablation of Cr-contaminated polyimide

Gouri Radhakrishnan; Nicholas Marquez

doi:10.1117/12.142084

16 March 1993 Excimer laser ablation of Cr-contaminated polyimide

Gouri Radhakrishnan, Nicholas Marquez

Proceedings Volume 1804, Rapid Thermal and Laser Processing; (1993) https://doi.org/10.1117/12.142084
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States

Abstract

Excimer laser radiation at 193 and 248 nm has been used for the maskless and selective removal of chromium (Cr) contaminants present on polyimide surfaces with fine-line gold (Au) metallization features patterned on them. Excimer laser cleaning has been successful in restoring the dielectric performance of these polyimide surfaces. The differences in ablation thresholds and rates and the respective process windows, established at 193 and 248 nm, for the removal of Cr are discussed.

Citation Download Citation

Gouri Radhakrishnan and Nicholas Marquez "Excimer laser ablation of Cr-contaminated polyimide", Proc. SPIE 1804, Rapid Thermal and Laser Processing, (16 March 1993); https://doi.org/10.1117/12.142084

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