Optomechanical design of 50-mm displacement measuring apparatus with nanometer accuracy

Yi-Ru Zhang; Ye-Qing Zhu; Zu-Shan Shen

doi:10.1117/12.156625

16 September 1993 Optomechanical design of 50-mm displacement measuring apparatus with nanometer accuracy

Yi-Ru Zhang, Ye-Qing Zhu, Zu-Shan Shen

Proceedings Volume 1998, Optomechanical Design; (1993) https://doi.org/10.1117/12.156625
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

This paper describes the application of a two-frequency heterodyne interferometry in the micro-displacement measurement, and discusses the optomechanical design of the displacement measuring apparatus with high precision, long measuring range, high moving sensitivity, and high stability. The measuring uncertainty of this apparatus is +/- 7 X 10^-3 micrometers within a 5 X 10⁴ micrometers measuring range. This apparatus is mainly used in testing and calibrating linear displacement sensors.

Citation Download Citation

Yi-Ru Zhang, Ye-Qing Zhu, and Zu-Shan Shen "Optomechanical design of 50-mm displacement measuring apparatus with nanometer accuracy", Proc. SPIE 1998, Optomechanical Design, (16 September 1993); https://doi.org/10.1117/12.156625

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