Paper
10 December 1993 Monolithic integrated optical device
S. D. Kiyashko, Alexander M. Kamuz, E. U. Ovsyannikov, Pavel F. Oleksenko, Oksana N. Stril'chuk
Author Affiliations +
Proceedings Volume 2108, International Conference on Holography, Correlation Optics, and Recording Materials; (1993) https://doi.org/10.1117/12.165424
Event: Holography, Correlation Optics, and Recording Materials, 1993, Chernivsti, Ukraine
Abstract
The integrated optical monolithic device which transforms the optical signal on electrical signal has been manufactured by means of new simple technology. This technology offers to consistently make taper channel waveguide, channel waveguide, and diffractive grating by means of a changing of the refractive index of planar CdSSe waveguide by surface-absorbed laser emission. In order to measure optical signal in channel waveguide the local waveguide photoresistor which has a good photosensitivity in the red wavelength range was formed on its surface. The ratio of dark resistance to resistance under illumination is 102 - 103.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. D. Kiyashko, Alexander M. Kamuz, E. U. Ovsyannikov, Pavel F. Oleksenko, and Oksana N. Stril'chuk "Monolithic integrated optical device", Proc. SPIE 2108, International Conference on Holography, Correlation Optics, and Recording Materials, (10 December 1993); https://doi.org/10.1117/12.165424
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KEYWORDS
Photoresistors

Waveguides

Integrated optics

Channel waveguides

Semiconductors

Cadmium sulfide

Optics manufacturing

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