Paper
28 July 1994 High-damage threshold antireflectors by physical-vapor-deposited amorphous fluoropolymer
Robert Chow, Maura K. Spragge, Gary E. Loomis, Ian M. Thomas, Frank Rainer, Richard L. Ward, Mark R. Kozlowski
Author Affiliations +
Abstract
High laser-resistant anti-reflective coatings were made from an amorphous fluoropolymer (Teflon AF2400) material by physical vapor deposition. Single layers of Teflon AF2400 were thermally deposited in a vacuum chamber. The refractive index and adhesion of the coatings were determined as a function of deposition rate (2 to 20 angstroms/s), substrate temperature (20 to 200 degree(s)C), and glow-discharge bias potential (-1500 to 1500 V).
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Chow, Maura K. Spragge, Gary E. Loomis, Ian M. Thomas, Frank Rainer, Richard L. Ward, and Mark R. Kozlowski "High-damage threshold antireflectors by physical-vapor-deposited amorphous fluoropolymer", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); https://doi.org/10.1117/12.180886
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KEYWORDS
Refractive index

Antireflective coatings

Optical coatings

Laser damage threshold

Transmittance

Silica

Oxides

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