Application and experimental verification of finite element modeling of friction effects for x-ray lithography mask mounts

Hector T. H. Chen; Matthew E. Hansen; Roxann L. Engelstad; William A. Johnson

doi:10.1117/12.175810

13 May 1994 Application and experimental verification of finite element modeling of friction effects for x-ray lithography mask mounts

Hector T. H. Chen, Matthew E. Hansen, Roxann L. Engelstad, William A. Johnson

Author Affiliations +

Proceedings Volume 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV; (1994) https://doi.org/10.1117/12.175810
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

In general, the application of finite element modeling to x-ray lithography mask distortions has assumed ideal conditions, i.e., frictionless mounts. Under actual conditions, friction can play a part in inducing both out-of-plane (OPD) and in-plane distortions (IPD) of the x-ray mask due to mounting or environmental conditions. This paper discusses the application of nonlinear three-dimensional interface elements to simulate friction in existing finite element (FEM) models of various masks and verifies the accuracy of the modeling with interferometric studies of both OPD and IPD for different mask configurations. Once the finite element models have been verified, the friction elements are then applied to a FEM model of the ARPA-NIST Mask Standard (with a kinematic mount) to determine the effects of friction on the IPD as a function of environmental temperature and clamping force. The results of this analysis show both the importance of designing ideal mounts (i.e., frictionless) as well as maintaining a fixed environmental temperature and controlling the clamping forces during the writing and exposure of x-ray lithography masks.

Citation Download Citation

Hector T. H. Chen, Matthew E. Hansen, Roxann L. Engelstad, and William A. Johnson "Application and experimental verification of finite element modeling of friction effects for x-ray lithography mask mounts", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); https://doi.org/10.1117/12.175810

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