Paper
13 May 1994 Soft x-ray output from the spherical pinch plasma radiation source (SPX II) for microlithography applications
Jiong Chen, Emilio Panarella, B. Hilko, Haibo Chen
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Abstract
Study of soft x-ray (0.8 - 10 keV) output from the SPX II, a spherical pinched plasma radiation source, is presented. The soft x-ray output increases with the discharge voltage. The output is also a function of the gases used and pressures. A simple analytic model was developed which can scale the imploding wave velocity with respect to the discharge voltage and the gas density. Experiments to measure the imploding wavefronts were carried out. The predictions of the model agree well with the measured results in a wide range of the parameter space.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jiong Chen, Emilio Panarella, B. Hilko, and Haibo Chen "Soft x-ray output from the spherical pinch plasma radiation source (SPX II) for microlithography applications", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); https://doi.org/10.1117/12.175809
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KEYWORDS
X-rays

Plasma

Spherical lenses

Magnetism

Wavefronts

Gases

Optical lithography

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