Rearrangement of novolak resins

M. Dalil Rahman; Ralph R. Dammel; Dana L. Durham

doi:10.1117/12.175382

16 May 1994 Rearrangement of novolak resins

M. Dalil Rahman, Ralph R. Dammel, Dana L. Durham

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175382
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

During the course of investigations into the synthesis of novolak resins for use in the microelectronics industry we have observed the rearrangement of the resin. Deeper investigation of this phenomenon has shown it to be a chain scission which leads to a rearrangement of the novolak structure. A possible mechanism is discussed.

Citation Download Citation

M. Dalil Rahman, Ralph R. Dammel, and Dana L. Durham "Rearrangement of novolak resins", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175382

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