Postprocessing of nm-period multilayer structures

A. A. Gorbunov; Wolfgang Pompe; Reiner Dietsch; Hermann Mai; Michael Panzner; Rhena Krawietz; B. Wehner

doi:10.1117/12.180974

28 July 1994 Postprocessing of nm-period multilayer structures

A. A. Gorbunov, Wolfgang Pompe, Reiner Dietsch, Hermann Mai, Michael Panzner, Rhena Krawietz, B. Wehner

Proceedings Volume 2213, Nanofabrication Technologies and Device Integration; (1994) https://doi.org/10.1117/12.180974
Event: Integrated Optoelectronics '94, 1994, Lindau, Germany

Abstract

We study effects of macro- and micro-postprocessing of multilayered synthetic Ni/C film structures. The structures have nm-period 1D modulation of concentration of the major components. Initially low surface and interface roughness of such structures makes them advantageous for application as a new type of substrates in nanofabrication technologies and for information storage with nm-resolution. Metastability of microstructure and high residual stresses favor the use of the structures themselves as a media for fine-scale processing.

Citation Download Citation

A. A. Gorbunov, Wolfgang Pompe, Reiner Dietsch, Hermann Mai, Michael Panzner, Rhena Krawietz, and B. Wehner "Postprocessing of nm-period multilayer structures", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); https://doi.org/10.1117/12.180974

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