Super resolution lithography using a direct-write laser pattern generator

Roelof W. Wijnaendts van Resandt; Christian F.J. Buchner

doi:10.1117/12.180969

28 July 1994 Super resolution lithography using a direct-write laser pattern generator

Roelof W. Wijnaendts van Resandt, Christian F.J. Buchner

Proceedings Volume 2213, Nanofabrication Technologies and Device Integration; (1994) https://doi.org/10.1117/12.180969
Event: Integrated Optoelectronics '94, 1994, Lindau, Germany

Abstract

This paper shows that a direct write laser has completely incoherent properties, even though the light used for illumination is coherent. As a result of this fact it has twice the resolving power of that of a coherent imaging system. Due to the extended depth of focus steep resist walls can be achieved using a direct write system. To demonstrate this exposure on 1.5 micrometers and 2.0 micrometers thick photoresist were made. A multiple- exposure technique is proposed to produce structures consisting of 0.25 micrometers lines and spaces, although the smallest structure which can be exposed is 0.75 micrometers .

Citation Download Citation

Roelof W. Wijnaendts van Resandt and Christian F.J. Buchner "Super resolution lithography using a direct-write laser pattern generator", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); https://doi.org/10.1117/12.180969

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