Paper
4 November 1994 Ion-assisted deposition of yttrium fluoride as a substitute for thorium fluoride: application to infrared antireflection coating on germanium
Jean-Yves Robic, Bernard Rolland, Jean-Claude Deutsch, Patrick Gallais
Author Affiliations +
Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192132
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
Yttrium fluoride has been proposed as a substitute for thorium fluoride in anti-reflection coatings for the infrared range. We have studied the ion assisted deposition (IAD) of YF3 in order to obtain dense and low absorbency layers in the 8 to 12 mm spectral window. Refractive index and extinction coefficient of this fluoride were determined from spectrophotometry measurements. We have then associated the YF3 with ZnS and Ge layers so as to obtain four layer anti-reflection coatings on germanium. The stress induced by each layer in the coating was measured and the sum was shown to be equal to the stress of the total coating. Eventually, an industrial, high efficiency, both side anti-reflection coating on germanium was developed using IAD YF3 film.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean-Yves Robic, Bernard Rolland, Jean-Claude Deutsch, and Patrick Gallais "Ion-assisted deposition of yttrium fluoride as a substitute for thorium fluoride: application to infrared antireflection coating on germanium", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192132
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Cited by 2 scholarly publications.
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KEYWORDS
Germanium

Antireflective coatings

Yttrium

Refractive index

Infrared radiation

Coating

Thorium

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