Micromachined silicon x-ray optics

Andrew W. Chen; Philip E. Kaaret; Thomas W. Kenny

doi:10.1117/12.193147

11 November 1994 Micromachined silicon x-ray optics

Andrew W. Chen, Philip E. Kaaret, Thomas W. Kenny

Proceedings Volume 2279, Advances in Multilayer and Grazing Incidence X-Ray/EUV/FUV Optics; (1994) https://doi.org/10.1117/12.193147
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

We employed anisotropic etching of single crystal silicon wafers for the fabrication of micron- scale optical elements. We have succeeded in producing silicon lenses with a geometry suitable for 1-d focusing x-ray optics. These lenses have an aspect ratio (40:1) suitable for x- ray reflection and have very good optical surface alignment. We have developed a number of process refinements which improved the quality of the lens geometry and the repeatability of the etch process. A significant progress was made in obtaining good optical surface quality. The RMS roughness was decreased from 110 angstroms for our initial lenses to 30 angstroms in the final lenses. A further factor of three improvement in surface quality is required for the production of efficiency x-ray optics. We present new wafer geometries designed to test the effect of the etch process on surface roughness.

Citation Download Citation

Andrew W. Chen, Philip E. Kaaret, and Thomas W. Kenny "Micromachined silicon x-ray optics", Proc. SPIE 2279, Advances in Multilayer and Grazing Incidence X-Ray/EUV/FUV Optics, (11 November 1994); https://doi.org/10.1117/12.193147

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