Technological ion source and its applications

Nikolay Vasilievic Gavrilov; V. N. Mizgulin; Sergey Pavlovich Nikulin; V. V. Bersenev

doi:10.1117/12.204994

3 March 1995 Technological ion source and its applications

Nikolay Vasilievic Gavrilov, V. N. Mizgulin, Sergey Pavlovich Nikulin, V. V. Bersenev

Proceedings Volume 2374, Novel Applications of Lasers and Pulsed Power; (1995) https://doi.org/10.1117/12.204994
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

An ion beam source based on a glow discharge in a magnetic field has been developed to produce gas and carbon ion beams with a cross sectional area of up to 200 cm². The source comes in two modifications, one of which, generating continuous beams of low-energy ions with a current of up to 150 mA, is used to treat material surfaces before deposition of coatings. The other, generating pulse-repetitive ion beams with a current of up to 1 A, ion energy up to 40 keV, pulse duration of 1 ms at a frequency of 3-50 Hz, is used to implant ions into materials. The source features a straightforward design and power circuit, high reliability and long lifetime, these advantages being ensured through the use of cold cathode discharge needing no initiating system.

Citation Download Citation

Nikolay Vasilievic Gavrilov, V. N. Mizgulin, Sergey Pavlovich Nikulin, and V. V. Bersenev "Technological ion source and its applications", Proc. SPIE 2374, Novel Applications of Lasers and Pulsed Power, (3 March 1995); https://doi.org/10.1117/12.204994

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