How manufacturing errors in binary optics arrays affect far field patterns

Paul D. Hillman

doi:10.1117/12.209031

12 May 1995 How manufacturing errors in binary optics arrays affect far-field patterns

Paul D. Hillman

Proceedings Volume 2383, Micro-Optics/Micromechanics and Laser Scanning and Shaping; (1995) https://doi.org/10.1117/12.209031
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

The use of scanning probe microscopies -- such as scanning tunneling microscopy (STM) and ballistic electron emission microscopy (BEEM) to study carrier transport through semiconductor heterostructures -- is reviewed. The ability of BEEM to probe buried structures below the surface can be exploited to study heterostructure band-offsets and resonant tunneling through quantum structures. It is shown that BEEM can serve as a powerful probe of the spectroscopy of such structures. The implications of such studies for research on quantum dots and the characterization of new optoelectronic materials are discussed.

Citation Download Citation

Paul D. Hillman "How manufacturing errors in binary optics arrays affect far-field patterns", Proc. SPIE 2383, Micro-Optics/Micromechanics and Laser Scanning and Shaping, (12 May 1995); https://doi.org/10.1117/12.209031

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