Paper
8 September 1995 Micromachined infrared detectors based on pyroelectric thin films
Dennis L. Polla, P. F. Baude, Linda Pham, Q. Mei, J. R. Choi, Chian-Ping Ye, L. F. Francis, Tho Truong Vu
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Abstract
Solid-state micromachining techniques have been used in the fabrication of low-stress silicon nitride thermal isolation structures for pyroelectric detectors. Thin films of PbTiO(subscript 3/ and other related Perovskite materials are integrated on these structures. Process compatibility with NMOS electronics is demonstrated.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dennis L. Polla, P. F. Baude, Linda Pham, Q. Mei, J. R. Choi, Chian-Ping Ye, L. F. Francis, and Tho Truong Vu "Micromachined infrared detectors based on pyroelectric thin films", Proc. SPIE 2552, Infrared Technology XXI, (8 September 1995); https://doi.org/10.1117/12.218259
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CITATIONS
Cited by 5 scholarly publications.
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KEYWORDS
Thin films

Silicon

Silicon films

Sol-gels

Infrared detectors

Electrodes

Etching

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