Good OPC, where will this drive mask CD tolerance and mask grid size

Donald J. Samuels; Wilhelm Maurer; Timothy R. Farrell

doi:10.1117/12.228213

8 December 1995 Good OPC, where will this drive mask CD tolerance and mask grid size

Donald J. Samuels, Wilhelm Maurer, Timothy R. Farrell

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228213
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

At low k₁ factors, optical proximity correction (OPC) is used to correct line size such that what is delivered by the lithography process is closer to the design dimension than an uncorrected process would deliver. OPC is usually derived for perfect masks and exposures. Random variation of the mask critical dimension (CD), wafer exposure latitude, and wafer defocus are examined for their effects on an OPC mask. Expected CD variation in the aerial image is given for each of these variables. Examining these variables will also give insight as to how fine an OPC can realistically be obtained, and how fine a grid size is needed in the manufacture of the mask.

Citation Download Citation

Donald J. Samuels, Wilhelm Maurer, and Timothy R. Farrell "Good OPC, where will this drive mask CD tolerance and mask grid size", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228213

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