Paper
3 November 1995 Analytical method for determination of absorbing film optical constants and thickness from reflectance spectra
Valery N. Filippov
Author Affiliations +
Proceedings Volume 2648, International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics; (1995) https://doi.org/10.1117/12.226187
Event: International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, 1995, Kiev, Ukraine
Abstract
It is shown that the air-film material reflectance coefficient, and that for the film material- substrate, can be restored from envelopes of the interference pattern in reflectance spectra. Doing so for oblique incidence of light and for two of its polarizations, optical parameters of an absorbing film may be determined without any film dispersion assumptions. Film thickness h is calculated then analytically. Knowing h, the film absorption coefficient can be obtained with high accuracy. Numerical calculations are given to illustrate the method application.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Valery N. Filippov "Analytical method for determination of absorbing film optical constants and thickness from reflectance spectra", Proc. SPIE 2648, International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, (3 November 1995); https://doi.org/10.1117/12.226187
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KEYWORDS
Reflectivity

Refractive index

Absorption

Interfaces

Inverse optics

Polarization

Silicon

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