Paper
10 May 1996 Sputter-deposited c-axis-oriented LiNbO3 thin films on silicon
Songshen Tan, J. Zou, Daniel D. Stancil, Tuviah E. Schlesinger, Michele Migliuolo
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Abstract
We report on the deposition of c-axis oriented LiNbO3 planar waveguides on silicon substrates. We have employed a combined SiO2/Si3N4 cladding layer to provide both optical confinement in the LiNbO3 as well as acting as a barrier layer to prevent Li diffusion into the SiO2. LiNbO3 films displaying exclusively the (006) reflection (no other orientations) in x-ray diffraction spectra have been produced. Post deposition rapid thermal annealing has been employed to improve the crystallinity of these films. Optical losses of about 18 dB/cm were measured for these films. We discuss the deposition conditions, the role of the silicon nitride in determining the LiNbO3 texture, as well as the performance of these layers as planar optical waveguides.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Songshen Tan, J. Zou, Daniel D. Stancil, Tuviah E. Schlesinger, and Michele Migliuolo "Sputter-deposited c-axis-oriented LiNbO3 thin films on silicon", Proc. SPIE 2700, Nonlinear Frequency Generation and Conversion, (10 May 1996); https://doi.org/10.1117/12.239650
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KEYWORDS
Silicon

Silicon films

Waveguides

Thin films

X-ray diffraction

Sputter deposition

Crystals

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