Improving the laser resistance of Al mirror and Si window by depositing dielectric protection layers

Quingchun Zhao; Zhengxiu Fan

doi:10.1117/12.240423

27 May 1996 Improving the laser resistance of Al mirror and Si window by depositing dielectric protection layers

Quingchun Zhao, Zhengxiu Fan

Proceedings Volume 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995; (1996) https://doi.org/10.1117/12.240423
Event: Laser-Induced Damage in Optical Materials: 1995, 1995, Boulder, CO, United States

Abstract

From two aspects: speeding up the heat conduction and reducing the absorption of the incidence laser energy, we studied the detailed means to improve the laser resistance of aluminum mirror and silicon window by depositing dielectric films and discussed its' feasibility. In the laser induced damage test by 1.06 micrometers IR laser and copper vapor laser, the damage thresholds of samples prepared by depositing dielectric protection layers have all been improved. It, in turn, verifies the feasibility of our protecting technology.

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Quingchun Zhao and Zhengxiu Fan "Improving the laser resistance of Al mirror and Si window by depositing dielectric protection layers", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240423

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KEYWORDS

Absorption

Dielectrics

Silicon

Mirrors

Laser applications

Laser damage threshold

Copper vapor lasers

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