Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool

Khanh B. Nguyen; Daniel A. Tichenor; Kurt W. Berger; Avijit K. Ray-Chaudhuri; Steven J. Haney; Rodney P. Nissen; Yon E. Perras; Richard William Arling; Richard H. Stulen; Linus A. Fetter; Donald M. Tennant; Donald L. White; Obert R. Wood II

doi:10.1117/12.240496

27 May 1996 Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool

Khanh B. Nguyen, Daniel A. Tichenor, Kurt W. Berger, Avijit K. Ray-Chaudhuri, Steven J. Haney, Rodney P. Nissen, Yon E. Perras, Richard William Arling, Richard H. Stulen, Linus A. Fetter, Donald M. Tennant, Donald L. White, Obert R. Wood II

Author Affiliations +

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240496
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

A laboratory extreme ultraviolet ltihography tool (EUVL) has been assembled at Sandia National Laboratories. Its major components include a Schwarzschild camera with 0.1 micrometers resolution integrated with a laser plasma source and a magnetically levitated stage. Other subsystems are a grazing-incidence optical system to maintain focus, and a through-the- lens Moire alignment system for overlay. This exposure tool is being used to study integration issues for EUVL. Experiments have been performed to characterize the alignment system's performance. The measured sensitivity of the alignment system is 25 nm 3(sigma) .

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Khanh B. Nguyen, Daniel A. Tichenor, Kurt W. Berger, Avijit K. Ray-Chaudhuri, Steven J. Haney, Rodney P. Nissen, Yon E. Perras, Richard William Arling, Richard H. Stulen, Linus A. Fetter, Donald M. Tennant, Donald L. White, and Obert R. Wood II "Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240496

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