Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As2S3

Lolita G. Rotkina; N. A. Kaliteevskaia; Ruben P. Seisyan; D. V. Smirnov; S. Babushkin; M. A. Vasilevsky

doi:10.1117/12.240483

27 May 1996 Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As2S3

Lolita G. Rotkina, N. A. Kaliteevskaia, Ruben P. Seisyan, D. V. Smirnov, S. Babushkin, M. A. Vasilevsky

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240483
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

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Lolita G. Rotkina, N. A. Kaliteevskaia, Ruben P. Seisyan, D. V. Smirnov, S. Babushkin, and M. A. Vasilevsky "Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As2S3", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240483

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