Efficient all-solid state 213-nm laser source for microlithography

Shigeo R. Kubota; Werner Wiechmann; Ling Yi Liu; Michio Oka; Hiroki Kikuchi; Hiroshi Suganuma; Hisashi Masuda; Minoru Takeda

doi:10.1117/12.240946

7 June 1996 Efficient all-solid state 213-nm laser source for microlithography

Shigeo R. Kubota, Werner Wiechmann, Ling Yi Liu, Michio Oka, Hiroki Kikuchi, Hiroshi Suganuma, Hisashi Masuda, Minoru Takeda

Author Affiliations +

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240946
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

We describe a 0.4W average power at maximum, frequency-quintupled Q-switched Nd:YAG laser at a repetition rate of 7 kHz, which is a potential light source for next generation microlithography. Calculated results for the conversion efficiencies considering pump depletion will be discussed. Our results allow to foresee further scaling up 213 nm power up to the 1W level by increasing the fundamental power.

Citation Download Citation

Shigeo R. Kubota, Werner Wiechmann, Ling Yi Liu, Michio Oka, Hiroki Kikuchi, Hiroshi Suganuma, Hisashi Masuda, and Minoru Takeda "Efficient all-solid state 213-nm laser source for microlithography", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240946

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