Step-and-scan and step-and-repeat: a technology comparison

Martin A. van den Brink; Hans Jasper; Steve D. Slonaker; Peter Wijnhoven; Frans Klaassen

doi:10.1117/12.240936

7 June 1996 Step-and-scan and step-and-repeat: a technology comparison

Martin A. van den Brink, Hans Jasper, Steve D. Slonaker, Peter Wijnhoven, Frans Klaassen

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240936
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

While the semiconductor manufacturing community is preparing for the transition from 0.35micrometers to 0.25micrometers technology, lithography equipment suppliers are preparing for the shift from step-and-repeat to step-and-scan systems. In addition, most wafer stepper users are planning to change from i-line to KrF laser wavelength technology. The question, however, is what are the advantages and disadvantages of scanners over steppers in a production environment. In this paper, we discuss the two different technologies using the following criteria: (1) throughput/cost of ownership, (2) CD control/depth of focus, (3) distortion and overlay. 248 nm lithography will be used for the 0.25micrometers process rule regime in combination with i-line systems being used for 50 to 70 percent of the lithography steps to reduce cost. Therefore, an ideal match is required between i-line systems and their DUV critical layer counterparts. For this reason, the economic equation of step-and-scan is determined by the total picture of matched DUV and i-line scanners. However, the comparisons between non-laser-based scanners and steppers and laser-based scanners and steppers are different. This paper discusses this subject using a combination of theoretical modeling and measured data. Imaging data from a new, DUV, double telecentric, 0.4 to 0.57 variable NA wafer stepper equipped with a variable coherence/annular illuminator is shown; thus proving that good imaging data at 0.25micrometers resolution at moderate cost is possible using wafer steppers.

Citation Download Citation

Martin A. van den Brink, Hans Jasper, Steve D. Slonaker, Peter Wijnhoven, and Frans Klaassen "Step-and-scan and step-and-repeat: a technology comparison", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240936

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