Paper
12 September 1996 SAS: a yield/failure analysis software tool
Susana de Jong Perez
Author Affiliations +
Abstract
As the device sizes decrease and the number of interconnect levels and wafer size increase, the device yield and failure analysis becomes more complex. Currently, software tools are being used to perform visual inspection techniques after many operations during which defects are detected on a sample of wafers. However, it has been observed that the correlation between the yield predicted on the basis of the defects found during such observations and the yield determined electrically at wafer final test is low. Of a greater interest to yield/failure analysis software tools is statistical analysis software. SASTM can perform extensive data analysis on kerf test structures' electrical parameters. In addition, the software can merge parametric and yield/fail bins data which reduces the data collection and data reduction activities involved in the correlation of device parameters to circuit functional operation. The data is saved in large databases which allow storage and later retrieval of historical data in order to evaluate process shifts and changes and their effect on yield. The merge of process parameters and on-line measurements with final electrical data, is also possible with the aid of process parameter extraction software. All of this data analysis provides excellent feedback about integrated circuit wafer processing.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Susana de Jong Perez "SAS: a yield/failure analysis software tool", Proc. SPIE 2874, Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II, (12 September 1996); https://doi.org/10.1117/12.250829
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KEYWORDS
Semiconducting wafers

Statistical analysis

Resistance

Data storage

Data analysis

Data processing

Etching

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