Paper
23 September 1996 Supercritical carbon dioxide solvent extraction from surface-micromachined micromechanical structures
Christopher W. Dyck, James H. Smith, Samuel L. Miller, E. M. Russick, C. L. J. Adkins
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Proceedings Volume 2879, Micromachining and Microfabrication Process Technology II; (1996) https://doi.org/10.1117/12.251210
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States
Abstract
Results are presented supporting the use of supercritical carbon dioxide (SCCO2) drying to enhance the yield of surface-micromachined micromechanical devices following the final release etch. The equipment and extraction process of the SCCO2 system are described, and results of successfully released cantilevered beams and microengines are presented. A new system capable of drying 6 inch wafers is also described.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher W. Dyck, James H. Smith, Samuel L. Miller, E. M. Russick, and C. L. J. Adkins "Supercritical carbon dioxide solvent extraction from surface-micromachined micromechanical structures", Proc. SPIE 2879, Micromachining and Microfabrication Process Technology II, (23 September 1996); https://doi.org/10.1117/12.251210
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Cited by 25 scholarly publications.
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KEYWORDS
Carbon dioxide

Liquids

Semiconducting wafers

Etching

Scanning electron microscopy

Oxides

Oxygen

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