Paper
3 October 1996 Physical and optical properties of sputtered lithium niobate thin films
Dexin X. Lu, Emile M. W. Wong, Edwin Y. B. Pun, Po Sheun Chung
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Abstract
LiNbO3 thin films were deposited by rf magnetron sputtering using LiNbO3 ceramic targets on z-cut single crystal LiTaO3 substrate. The as-deposited thin films were annealed at 550 degrees Celsius to 650 degrees Celsius for 60 min in oxygen ambient. The results of x-ray diffraction indicate that the dominant orientation of the sputtered LiNbO3 thin film is (202). The transmittance spectra of LiNbO3 thin films annealed at different temperatures were measured and compared with that of bulk single crystal substrate (the measured wavelength range is from 300 nm to 800 nm). The transmittance drops down to about 10% at 300 nm wavelength and has a value of 70 to approximately 80% at 800 nm wavelength.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dexin X. Lu, Emile M. W. Wong, Edwin Y. B. Pun, and Po Sheun Chung "Physical and optical properties of sputtered lithium niobate thin films", Proc. SPIE 2897, Electro-Optic and Second Harmonic Generation Materials, Devices, and Applications, (3 October 1996); https://doi.org/10.1117/12.252926
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Cited by 2 scholarly publications.
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KEYWORDS
Thin films

Transmittance

Crystals

Ceramics

Sputter deposition

Thin film deposition

Single crystal X-ray diffraction

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