850 nm proton-implanted 8 x 8 VCSEL array design and performance measurements

Peter S. Guilfoyle; John M. Hessenbruch; Jack L. Jewell; Henryk Temkin

doi:10.1117/12.271102

4 April 1997 850 nm proton-implanted 8 x 8 VCSEL array design and performance measurements

Peter S. Guilfoyle, John M. Hessenbruch, Jack L. Jewell, Henryk Temkin

Proceedings Volume 3005, Optoelectronic Interconnects and Packaging IV; (1997) https://doi.org/10.1117/12.271102
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

Arrays of 8 X 8 of GaAs/AlGaAs vertical cavity surface emitting lasers (VCSELs), which operate at approximately 850 nm, are being fabricated for integration with low power, optoelectronic integrated circuits. These high performance optoelectronic computing modules are being developed for high speed switching and data processing applications. The VCSEL array is a gain-guided, top-surface emitting device. It is fabricated from a GaAs/AlGaAs p-i-n distributed Bragg reflector structure, which is grown by metal organic chemical vapor deposition. The VCSEL fabrication process involves two stages of hydrogen ion implantation and three stages of metallization. A set of five photolithography masks has ben developed for VCSEL fabrication.

Citation Download Citation

Peter S. Guilfoyle, John M. Hessenbruch, Jack L. Jewell, and Henryk Temkin "850 nm proton-implanted 8 x 8 VCSEL array design and performance measurements", Proc. SPIE 3005, Optoelectronic Interconnects and Packaging IV, (4 April 1997); https://doi.org/10.1117/12.271102

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