Fabrication and application of subwavelength gratings

Bernd Schnabel; Ernst-Bernhard Kley

doi:10.1117/12.271418

11 April 1997 Fabrication and application of subwavelength gratings

Bernd Schnabel, Ernst-Bernhard Kley

Proceedings Volume 3008, Miniaturized Systems with Micro-Optics and Micromechanics II; (1997) https://doi.org/10.1117/12.271418
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

Binary gratings with periods below the wavelength of visible light may be fabricated by e-beam direct writing in a resist layer and then transferred into other materials by ion beam etching. We used a well-adapted e-beam writer 'LION LV1' which allows feature sizes of 100nm and below and arbitrary directions of the grating lines as well as radial, circular or elliptical grating lines. By transfering such gratings into metallic layers polarization effects may be obtained which depend both on the parameters of the gratings and of the metal layer. The dependence of the polarization on grating period and duty cycle was measured for chromium layers with 35nm thickness. By writing concentric circular gratin lines, interesting polarization analyzers may be fabricated. in addition to metal stripe gratings, dielectric subwavelength gratings show interesting properties, too. They may be used for coupling free space light into a planar or rib waveguide with incoupling efficiencies higher than 50 percent. Both for metallic and dielectric gratings, the optical properties strongly depend on an accurate and reproducible fabrication process which, therefore, has to be subject of further research.

Citation Download Citation

Bernd Schnabel and Ernst-Bernhard Kley "Fabrication and application of subwavelength gratings", Proc. SPIE 3008, Miniaturized Systems with Micro-Optics and Micromechanics II, (11 April 1997); https://doi.org/10.1117/12.271418

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