Simulating photomask edge roughness and corner rounding

Konstantinos Adam; Robert John Socha; Thomas V. Pistor; Andrew R. Neureuther

doi:10.1117/12.275911

7 July 1997 Simulating photomask edge roughness and corner rounding

Konstantinos Adam, Robert John Socha, Thomas V. Pistor, Andrew R. Neureuther

Proceedings Volume 3050, Metrology, Inspection, and Process Control for Microlithography XI; (1997) https://doi.org/10.1117/12.275911
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Corner rounding and edge roughness of a rectangular opening at a glass-chrome mask are simulated with TEMPEST. The intensity patterns on the image plane are extracted and compared for these defects at several degrees of fabrication-induced imperfection. A 4X - DUV lithography printing system is assumed with NA equals 0.6 and (sigma) equals 0.5. The prototypical geometry simulate was a 4 micrometers X 1 micrometers line on the mask. The results indicate that the rounding of the corners does not decrease the printed area by more than 2 percent for a 0.4 micrometers radius corner rounding and that roughness should not be a concern, at least in DUV, since it does not crucially affect the linewidth of the printed area.

Citation Download Citation

Konstantinos Adam, Robert John Socha, Thomas V. Pistor, and Andrew R. Neureuther "Simulating photomask edge roughness and corner rounding", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); https://doi.org/10.1117/12.275911

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