Paper
28 July 1997 Hierarchical mask data design system (PROPHET) for aerial image simulation, automatic phase-shifter placement, and subpeak overlap checking
Eiji Tsujimoto, Takahiro Watanabe, Yoshio Sato, Akemi Moniwa, Yoshinobu Igarashi, Kyoji Nakajo
Author Affiliations +
Abstract
A hierarchical and interactive mask data design system (PROPHET) has been developed for aerial image simulation, fast subpeak overlap checking of adjacent patterns in attenuated phase-shifting masks, and automatic phase-shifter placement. This system, linked with a layout editor through an added-on menu, allows the designer to perform layout while concurrently considering mask data, taking into account design restrictions imposed by ultra-high resolution technology.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eiji Tsujimoto, Takahiro Watanabe, Yoshio Sato, Akemi Moniwa, Yoshinobu Igarashi, and Kyoji Nakajo "Hierarchical mask data design system (PROPHET) for aerial image simulation, automatic phase-shifter placement, and subpeak overlap checking", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277250
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication and 70 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Phase shifts

Semiconducting wafers

Mask making

Wafer-level optics

Information operations

Interfaces

RELATED CONTENT


Back to Top