Ion sputter deposition of shape memory alloy films for microactuators

Sam T. Davies; Kazuyoshi Tsuchiya

doi:10.1117/12.284477

5 September 1997 Ion sputter deposition of shape memory alloy films for microactuators

Sam T. Davies, Kazuyoshi Tsuchiya

Proceedings Volume 3223, Micromachining and Microfabrication Process Technology III; (1997) https://doi.org/10.1117/12.284477
Event: Micromachining and Microfabrication, 1997, Austin, TX, United States

Abstract

Shape memory alloy (SMA) materials have a number of desirable properties which make them strong candidates for microactuator applications. Compared with other means of microactuation based on piezoelectric, electrostatic or bimetallic principles, SMA microactuators have advantages which include high maximum work energy density, high power/mass ratio and the capability of being driven without high applied electric fields. Consequently, other desirable features such as biocompatibility and scalability to small dimensions can also be exploited. In this paper we report on the production of TiNi shape memory films by ion sputter deposition onto unheated substrates using argon ions generated by a Kaufman- type source. The films were characterized by electrical resistivity measurements and by x-ray reflectometry. R-phase and martensitic transformations are seen without high temperature annealing and the shape memory properties observed are compared with those of films prepared by dc and rf magnetron sputtering.

Citation Download Citation

Sam T. Davies and Kazuyoshi Tsuchiya "Ion sputter deposition of shape memory alloy films for microactuators", Proc. SPIE 3223, Micromachining and Microfabrication Process Technology III, (5 September 1997); https://doi.org/10.1117/12.284477

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