Performance of positive-tone chemically amplified resists for next-generation photomask fabrication

Toshikazu Segawa; Masa-aki Kurihara; Shiho Sasaki; Hiroyuki Inomata; Naoya Hayashi; Hisatake Sano

doi:10.1117/12.301231

12 February 1997 Performance of positive-tone chemically amplified resists for next-generation photomask fabrication

Toshikazu Segawa, Masa-aki Kurihara, Shiho Sasaki, Hiroyuki Inomata, Naoya Hayashi, Hisatake Sano

Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301231
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States

Abstract

Several types of chemically amplified resists (CARs) have been evaluated in comparison with other types of resists. The evaluated CARs were found to have better performance than conventional resists and to satisfy the requirements for next generation reticle fabrication. Especially CARs have high sensitivity and high contrast enough to make photomasks with e-beam writers and have good dry-etch durability. We evaluated the allowance of baking conditions. It was found that it was important to minimize the dependence on prebake temperature as well as on post exposure bake temperature. The influence of airborne contaminants on post exposure delay (PED) stability of CARs was investigated. PED stability depends on resist materials and the ammonia concentration in the process environment. The use of a chemical filter is effective in improving PED stability. In conclusion, CARs can meet the requirements for resists used for next generation reticle fabrication.

Citation Download Citation

Toshikazu Segawa, Masa-aki Kurihara, Shiho Sasaki, Hiroyuki Inomata, Naoya Hayashi, and Hisatake Sano "Performance of positive-tone chemically amplified resists for next-generation photomask fabrication", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301231

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