Modeling study of image formation with point sources

Srinivas B. Bollepalli; Mumit Khan; Franco Cerrina

doi:10.1117/12.309569

5 June 1998 Modeling study of image formation with point sources

Srinivas B. Bollepalli, Mumit Khan, Franco Cerrina

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309569
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

It is well known that a point source produces a small magnification of the mask pattern on the wafer due to divergence; the effect becomes especially noticeable at the corners and edges of the field. In this article we model the image formation due to a point source and compare the deviations of the aerial images and developed patterns, from those at the center of the field. We illustrate the behavior with several computational results.

Citation Download Citation

Srinivas B. Bollepalli, Mumit Khan, and Franco Cerrina "Modeling study of image formation with point sources", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309569

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available