Overlay accuracy of reticles

Hisatsugu Shirai; Kanji Takeuchi; Kazumasa Shigematsu

doi:10.1117/12.310796

29 June 1998 Overlay accuracy of reticles

Hisatsugu Shirai, Kanji Takeuchi, Kazumasa Shigematsu

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310796
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

This paper describes the study on overlay accuracy of reticles, using a reticle set for DRAM. It is found that single reticle pattern placement has to be higher accuracy than overlay of reticles, which may be a majority in the total overlay accuracy. Concerning some points of a reticle set, we found that there is a very large value. To match overlay accuracy of reticles with the demand of devices, we have shown that the suitable reticle exposure system has to be used and managed exactly. In order to assure overlay accuracy of a reticle set, it was proposed that single reticle pattern placement accuracy must be higher than overlay accuracy demand and the overlay accuracy yield also should be shown in some cases.

Citation Download Citation

Hisatsugu Shirai, Kanji Takeuchi, and Kazumasa Shigematsu "Overlay accuracy of reticles", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310796

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