Ultrafast High Resolution Contact Lithography Using Excimer Lasers

K. Jain; C. G. Willson; B. J. Lin

doi:10.1117/12.933585

13 September 1982 Ultrafast High Resolution Contact Lithography Using Excimer Lasers

K. Jain, C. G. Willson, B. J. Lin

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933585
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

A new technique for fine-line, high-speed photolithography using ultraviolet excimer lasers is proposed and demonstrated. Absence of speckle and resolution down to 1000 line-pairs/mm are experimentally demonstrated. Using a XeCl laser at 308 nm and a KrF laser at 249 nm, excellent quality images are obtained by contact printing in two positive photoresists. These images are comparable to state-of-the-art lithography done with conventional lamps, the major difference being that the excimer laser technique is -2 orders of magnitude faster. Preliminary results on reciprocity behavior in several resists are also presented.

Citation Download Citation

K. Jain, C. G. Willson, and B. J. Lin "Ultrafast High Resolution Contact Lithography Using Excimer Lasers", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933585

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available