New approach for the fabrication of diffractive optical elements with rotationally symmetric phase distribution

Yongtian Wang; Fang Cui; Yunan Sun; Dazun Zhao

doi:10.1117/12.302470

10 March 1998 New approach for the fabrication of diffractive optical elements with rotationally symmetric phase distribution

Yongtian Wang, Fang Cui, Yunan Sun, Dazun Zhao

Author Affiliations +

Proceedings Volume 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing; (1998) https://doi.org/10.1117/12.302470
Event: Optical Information Science and Technology, 1997, Moscow, Russian Federation

Abstract

Diffractive optical elements (DOEs), especially those used in imaging systems, often have phase distributions of rotational symmetry. A metal mask is designed such that it has different open slit angles on different radii, and the angle on a specific radius is inversely proportional to the phase magnitude there. The substrate is placed immediately under this mask and rotated relative to it during ion etching. The amount of etching on different radii of the substrate is thus modulated by the mask, and the DOE is produced in a single step. Experiments show that this is a practical and low-cost manufacture method when the phase variation along the radius is not too rapid.

Citation Download Citation

Yongtian Wang, Fang Cui, Yunan Sun, and Dazun Zhao "New approach for the fabrication of diffractive optical elements with rotationally symmetric phase distribution", Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); https://doi.org/10.1117/12.302470

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