Paper
19 June 1998 Mass preparation of photosensitive fibers and 248-nm excimer writing of fiber gratings by use of a π/2 phase shift mask
K. Roger Lee, Steve Lin, Chia-Tse Sun
Author Affiliations +
Proceedings Volume 3420, Optical Fiber Communication; (1998) https://doi.org/10.1117/12.312853
Event: Asia Pacific Symposium on Optoelectronics '98, 1998, Taipei, Taiwan
Abstract
Hundreds of photosensitive fibers have been prepared by the procedure of hydrogen loading in SMF-28 fibers and exposed to the UV lamp. This process can temporarily prevent hydrogen in fibers from outgas and maintain the photosensitivity for 4-5 days. It has been observed that hydrogen will diffuse out the core of fibers within several hours if fiber prepared by hydrogen loading is not exposed to excimer or UV radiation immediately. Such preparation is convenient for mass production of fiber gratings. The photosensitivity of fibers is judged according to the maximum reflectivity of fiber gratings written by 248nm excimer laser and OH-ion absorption at 1380nm wavelength. We also conclude that forming Bragg gratings in fibers of above preparation by use of a (pi) /2 phase shift mask, where the diffraction intensity ratio of plus/minus first order to zero order is 45-55 percent, can reach above 30dB in reflectivity. Notably, the periodic modulation of refractive index in fiber Bragg grating is permanent after the verification of thermal aging test for 60 days.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Roger Lee, Steve Lin, and Chia-Tse Sun "Mass preparation of photosensitive fibers and 248-nm excimer writing of fiber gratings by use of a π/2 phase shift mask", Proc. SPIE 3420, Optical Fiber Communication, (19 June 1998); https://doi.org/10.1117/12.312853
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KEYWORDS
Optical fibers

Ultraviolet radiation

Fiber Bragg gratings

Hydrogen

Phase shifts

Reflectivity

Lamps

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