Paper
7 May 1999 Laser-induced modifications of binary Co-Si and ternary Co-Ti-Si films
Maris Knite, Valentinas J. Snitka, Arthur Medvids
Author Affiliations +
Proceedings Volume 3571, Tenth International School on Quantum Electronics: Laser Physics and Applications; (1999) https://doi.org/10.1117/12.347651
Event: 10th International School on Quantum Electronics: Lasers: Physics and Applications, 1998, Varna, Bulgaria
Abstract
Formation of clusters of vacancies in crystalline CoSi2 has been attained by Q-switched YAG:Nd laser. The X-ray diffraction, atomic force microscopy and electrical resistance measurements, and infrared reflection spectra give evidence of formation of Si vacancies. By laser treatment with intensity ranging from 20 to 50 MW/cm2 in air the magnitude of the resistance of the CoSi2 layer increases approximately by a factor of three, in liquid nitrogen medium approximately by a factor of five. The second task of the present study has been to use the pulsed laser treatment of approach as much as possible the zero value of thermal coefficient of resistivity (TCR) of a Co- Ti-Si layer. The TCR of a Co-Ti-Si layer subject to previous treatment for 30 min at 460 degree(s)C becomes smaller than 10-5 K-1 after irradiation of nine 150 ns CO2 laser pulses of the intensity I equals 1 MW/cm2.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Maris Knite, Valentinas J. Snitka, and Arthur Medvids "Laser-induced modifications of binary Co-Si and ternary Co-Ti-Si films", Proc. SPIE 3571, Tenth International School on Quantum Electronics: Laser Physics and Applications, (7 May 1999); https://doi.org/10.1117/12.347651
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silicon

Resistance

Cobalt

Crystals

Atomic force microscopy

Carbon dioxide lasers

Temperature metrology

Back to Top