Chemical oxygen-iodine laser using rf-discharge dissociation of I2

Tsuyoshi Wakazono; Katsuki Hashimoto; Tomohiro Takemoto; Taro Uchiyama; Mikio Muro

doi:10.1117/12.334444

22 December 1998 Chemical oxygen-iodine laser using rf-discharge dissociation of I₂

Tsuyoshi Wakazono, Katsuki Hashimoto, Tomohiro Takemoto, Taro Uchiyama, Mikio Muro

Proceedings Volume 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1998) https://doi.org/10.1117/12.334444
Event: Twelfth International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 1998, St. Petersburg, Russian Federation

Abstract

The gain of COIL is so small (about 0.13%/cm) that scaling up is necessary to achieve high power but considering practical use, reduction of system size is needed. Now, new type of small size COIl using RF discharge dissociation of I₂ is presented. The output power of RFCOIL was obtained two or three times higher power than that of normal COIL and chemical efficiency was 12% at 340 mmol/min chlorine flow rate.

Citation Download Citation

Tsuyoshi Wakazono, Katsuki Hashimoto, Tomohiro Takemoto, Taro Uchiyama, and Mikio Muro "Chemical oxygen-iodine laser using rf-discharge dissociation of I₂", Proc. SPIE 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (22 December 1998); https://doi.org/10.1117/12.334444

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