Electric discharge repetitively pulsed HF/DF chemical laser operating on the mixture F2 + H2 (D2)

C. A. Kutumov; E. A. Klimuk; Georgiy A. Troshchinenko

doi:10.1117/12.334496

22 December 1998 Electric discharge repetitively pulsed HF/DF chemical laser operating on the mixture F₂ + H₂ (D₂)

C. A. Kutumov, E. A. Klimuk, Georgiy A. Troshchinenko

Proceedings Volume 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1998) https://doi.org/10.1117/12.334496
Event: Twelfth International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 1998, St. Petersburg, Russian Federation

Abstract

The HF/DF pulsed chemical lasers, operating on the unchain mixtures SF₆ + H₂ (D₂), have rather low efficiency and relatively small number of lines in a radiation spectrum. The application fluorine-hydrogen (deuterium) mixtures allows to raise many times the specific energy characteristics of the laser and number of lines in a radiation spectrum, that potentially makes such a laser as a universal source of radiation in systems of an ecological and technological monitoring. For the specified applications the generation spectrum on molecules HF-DF covers a wavelength range of 2.6 - 5 micrometer of an absorption spectrum of many atmospheric pollution and technological products. However, for creation the HF/DF repetitively pulsed chemical laser (RPCL) it is necessary to solve a number of scientific and technical problems, therefore till now the mentions of an effective RPCL realization are absent. Highly effective HF/DF-RPCL with active volume 50 cm³ was developed and created. It is initiated by the barrier discharge and operates with the pulse repetition rate up to 50 Hz. In a mode of generation on a molecule HF its characteristics are investigated in detail: a technical efficiency -- up to 10% average power of radiation - - up to 6.5 W, number of the spectrum lines of 23.

Citation Download Citation

C. A. Kutumov, E. A. Klimuk, and Georgiy A. Troshchinenko "Electric discharge repetitively pulsed HF/DF chemical laser operating on the mixture F₂ + H₂ (D₂)", Proc. SPIE 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (22 December 1998); https://doi.org/10.1117/12.334496

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