Thin film deposition by pulsed laser ablation: the direct simulation Monte Carlo

Nickolay Y. Bykov; German A. Lukianov

doi:10.1117/12.334405

22 December 1998 Thin film deposition by pulsed laser ablation: the direct simulation Monte Carlo

Nickolay Y. Bykov, German A. Lukianov

Proceedings Volume 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1998) https://doi.org/10.1117/12.334405
Event: Twelfth International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 1998, St. Petersburg, Russian Federation

Abstract

Gasdynamics of thin films deposition by laser ablation technology has been investigated by the direct simulation Monte Carlo (DSMC) method. Whole spectrum of criterions that determine flow parameters was posed. Basic criterions influence on flow picture and behavior of flux parameters was investigated. High-performance parallel algorithm of DSMC of non-stationary flows has been elaborated for multiprocessors systems. Thin films, laser ablation, gasdynamic processes, direct simulation.

Citation Download Citation

Nickolay Y. Bykov and German A. Lukianov "Thin film deposition by pulsed laser ablation: the direct simulation Monte Carlo", Proc. SPIE 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (22 December 1998); https://doi.org/10.1117/12.334405

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